Cart

No products

Shipping $0.00
Total $0.00

Cart Check out

IEC 62047-25:2016

IEC 62047-25:2016

IEC 62047-25:2016 Semiconductor devices - Micro-electromechanical devices - Part 25: Silicon based MEMS fabrication technology - Measurement method of pull-press and shearing strength of micro bonding area

More details

Download

PDF AVAILABLE FORMATS IMMEDIATE DOWNLOAD
$58.80

$147.00

(price reduced by 60 %)

IEC 62047-25:2016 specifies the in-situ testing method to measure the bonding strength of micro bonding area which is fabricated by micromachining technologies used in silicon-based micro-electromechanical system (MEMS). This document is applicable to the in-situ pull-press and shearing strength measurement of the micro bonding area fabricated by microelectronic technology process and other micromachining technology.

Contact us